Method of Nitride coating

Nitride can be coated more uniformly

Overview

Conventional nitride coating methods include CVD (chemical vapor deposition) and PVD (physical vapor deposition). However, there is a problem that the manufacturing process is complicated and the work is not efficient because pressure adjustment and atmosphere replacement by vacuum equipment are required.

Therefore, the nitride coating in the atmospheric pressure has been developed, but there is a problem that the surface is uneven.

The present invention shows follow features, and it can solve above problems.
・ TiN(Nitride coating) is formed by microwave process.
・ Vacuum process is not needed.
・ Nitride coating is formed more uniformly.

Features・Outstandings

Product Application

・Biomedical and dental implant members
・Cutting, Mold instrument, machine tool

IP Data

IP No.　 ： WO2020/184192
Inventor ： FUKUSHIMA Jun, TAKIZAWA Hirotsugu, IIZUKA Nozomi, ITO Aya, ITO Tomoyo, OGAWA Toru, SASAKI Keiichi
keyword ： Titanium nitride, TiN, Microwave process, Durability, Design